Historically the transcription of design data, in preparation for mask manufacture, has been to produce flat exposure tool data. Recent developments in hierarchical fracturing in the CATSTM tool are reviewed and explained. Current design data, especially memory products or even microprocessors containing cache, benefit immensely from these developments. The pertinent CATSTM commands are reviewed. Records of typical data fractures are presented and reviewed, showing the overall decrease in CPU usage with the hierarchal methods. The concomitant decrease in file sizes is also shown.
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