Laser Proximity Correction for Advanced Mask Manufacturing

In this paper, we present a fully automatic mask laser proximity effect (LPE) correction in compliance with existing mask data preparation (MDP) flow to enable ALTA3000 0.18Ám mask production capability that is at least one generation beyond its current application. For many years, production-proven OPC methodology in wafer houses has been integrated with CATSTM, the de facto standard product for preparing IC data for mask manufacturing, to correct mask process distortion. Excellent LPE correction results have been obtained repeatedly on 0.18Ám test and production masks on an ALTA3000 that was originally designed for 0.35Ám production.

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