IC Tools White Papers
- Power Management Poses a Critical Design Constraint in the SoC World of Consumer Applications
- Front-End Logic Design: Taking the Risk Out and Putting Schedule Predictability In
- Characterization-to-Silicon DFM Design Flow
- Talus Automated Chip Creation Methodology
- Using Phase Shifting to Extend 248nm Litho Beyond the 50nm Gate Process
- Three Paths to Improved Critical Dimension Control for Patterning 200nm to 100nm Transistor Gates
- The Application of Alternating Phase-Shifting Masks to 140 nm Gate Patterning: Line Width Control Improvements and Design Optimization
- Sub-wavelength Lithography: An Impact of Photo Mask Errors on Circuit Performance
- Sub-100 nm silicon on insulator complimentary metal-oxide semiconductor transistors by deep ultraviolet optical lithography
- Resolution Enhancement Techniques and Mask Manufacturability for Sub-Wavelength Lithography
- Phase Shift Lithography in the Manufacture of sub-120 nm Low Voltage DSP Circuits
- Performance Optimization of the Double Exposure Alternating PSM for (sub-) 100 nm ICs
- Patterning 80-nm Gates Using 248-nm Lithography: An Approach for 0.13 micron VLSI Manufacturing
- New alternating phase-shifting mask conversion methodology using phase conflict resolution
- Investigation of Proximity Effects in Alternating Aperture Phase Shifting Masks
- Implementation Considerations for Trim-Mask PSM
- Full Phase-Shifting Methodology for 65nm Node Lithography
- Challenges of 50nm Gate Process in Alternating Phase Shifting Lithography
- Another View on Extending ArF to the 65nm Node
- An Integrated Phase-shifting Software Solution for IC Design to Manufacturing
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