IBM and Chartered Approve Calibre for 90nm Design Enablement Platform

5/25/2004 - Mentor Graphics® Corporation (Nasdaq: MENT) announced that its Calibre® design-to-silicon platform is an approved physical verification tool for the 90-nanometer (nm) semiconductor process platform jointly developed by IBM and Chartered Semiconductor Manufacturing. Validation efforts were conducted as part of the IBM-Chartered cross-foundry design enablement program aimed at reducing the risks and costs of designing chips manufactured with the IBM-Chartered 90nm process.

Participation in the IBM-Chartered design enablement program strengthens the successful history Mentor has maintained with both companies. Combining Calibre with this effort is a natural extension to the series of collaborations between Mentor and IBM designed to ensure highest quality silicon for mutual customers. In addition, the Calibre platform has long been the internal sign-off standard at Chartered.

"Advanced physical verification tools are critical to achieving success with nanometer manufacturing processes," said Tom Reeves, vice president, semiconductor products and solutions, IBM Systems & Technology Group. "Our design enablement program ensures that chip designers have access to leading-edge technologies that have been validated by our internal 90nm development team."

"Performance in speed, accuracy and capacity are critical factors in the verification of today's complex SoCs. By providing pre-qualified Calibre rules files, we are giving designers a quicker, more accurate path to production silicon," said Kevin Meyer, vice president of worldwide marketing and services at Chartered. "The validation of Calibre for physical verification is yet another significant step by IBM and Chartered to further expand the design ecosystem for our 90nm process platform."

"Our relationship with both IBM and Chartered enables us to quickly provide our mutual customers with solutions to attain their design goals," said Joe Sawicki, vice president and general manager of the design-to-silicon division at Mentor Graphics. "Our market-leading Calibre design-to-silicon platform provides production-proven solutions to successfully move designs to silicon in nanometer technologies."

CMOS 9SF 90nm technology files and models for Calibre DRCTM, Calibre LVSTM and Calibre xRCTM are now available. These offerings exploit the most advanced physical verification and parasitic extraction capabilities of the Calibre design-to-silicon platform.

About Mentor Graphics
Mentor Graphics Corporation (Nasdaq: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $675 million and employs approximately 3,700 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777; Silicon Valley headquarters are located at 1001 Ridder Park Drive, San Jose, California 95131-2314. World Wide Web site:

Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation.

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