2/20/2003 - Mentor Graphics' fully supported Calibre® DRC (design rule check) rule files are now available for 90-nanometer (nm) technologies from UMC. These 90nm rule files exploit the most advanced capabilities of Calibre, which has been UMC's standard for physical verification since 1998.
"At the 90nm technology generation, it becomes increasingly important for our customers to seamlessly move from design to successful silicon due to the complexity of modern SOC designs," said Ken Liou, division director of the Design Support Division at UMC. "Calibre rule files, production-proven for five years at UMC, receive extensive qualification to smooth the transition from tape-out to manufacture, thus reducing cost and time-to-profit for our customers."
"The 90nm node will not only require expanded performance, capacity and accuracy from a physical verification tool, but also the flexibility to handle system-on-chip designs that incorporate analog and digital IP of divergent design styles," said Joseph Sawicki, general manager, Mentor Graphics® design-to-silicon division. "Calibre is ready now for the challenges of 90nm as well as next-generation technologies."
UMC is a valued partner of Mentor Graphics and is a member of Mentor's Design for Manufacture (DFM) Silicon Partners Program. This partnership guarantees mutual customers an extensive set of rule files for Calibre DRCTM, Calibre LVSTM (layout vs. schematic) and Calibre xRCTM (parasitic extraction). Rule files can be downloaded from UMC's website, dramatically reducing setup and development time for physical verification and reducing the chances of manufacturing errors.
Calibre Physical Verification and Subwavelength Manufacturability Tools
Calibre is the industry's only complete physical verification and subwavelength solution. The Calibre physical verification tool suite, which includes Calibre DRC and Calibre LVS, ensures that IC physical designs conform to manufacturing rules and match the intended functionality of the chip. As the market leader in physical verification tools, Calibre is the industry standard, used in 19 of the world's 25 largest integrated device manufacturers, as well as all the top foundries and deep sub-micron library providers.
For subwavelength designs, Calibre leverages its hierarchical verification engine to provide a tool suite that adds, models and verifies layouts for all four RET techniques: optical and process correction (OPC); phase-shift mask (PSM); scattering bars (SB); and, off-axis illumination (OAI). New techniques, such as sub-100-nm capable double-exposure dipole decomposition, are currently being refined for production deployment.
About Mentor Graphics
Mentor Graphics Corporation (Nasdaq: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $600 million and employs approximately 3,500 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777; Silicon Valley headquarters are located at 1001 Ridder Park Drive, San Jose, California 95131-2314. World Wide Web site: www.mentor.com.
Calibre and Mentor Graphics are registered trademarks, and Calibre DRC, Calibre LVS and Calibre xRC are trademarks, of Mentor Graphics.
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