Mentor Graphics Calibre Product Line Joins Forces with IMEC to Advance Subwavelength Microlithography

5/28/2002 - Mentor Graphics Corporation (Nasdaq: MENT) today announced that the company's Calibre® division has reached an agreement with IMEC, the leading European independent research center in the field of microelectronics, nanotechnology, enabling design methods and technologies for information and communications technologies (ICT) systems, to cooperate on the development of subwavelength microlithography. IMEC will use the Calibre® resolution enhancement technology (RET) software in a collaborative effort to advance high-numerical aperture (NA) 193-nanometer, and 157-nanometer (nm) microlithography processes. The use of RET software is the only way to enable acceptable chip yield at today's advanced process nodes.

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