3/11/2002 - Mentor Graphics Corporation today announced the availability of the first software solutions in the Calibre® mask data preparation (MDP) product line, the Calibre FRACTUREm(TM) and Calibre MDPview(TM) tools. The new MDP software performs geometry processing and then converts IC layout directly into mask writer formats. The tool suite ensures time-to-market and optimal capital equipment utilization for mask manufacturers and semiconductor companies by enabling mask writers to maintain current performance levels even as gate count and design sizes continue to grow. Integrated with Calibre's industry-standard physical verification and manufacturability tools, such as DRC and OPC, MDP completes the Calibre layout-to-silicon product offering.
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