Graphics Showcases New Mask Data Prep Technology at 27th Annual SPIE Microlithography Conference

2/27/2002 - Mentor Graphics Corporation will preview its new Calibre® mask data preparation (MDP) technology and contribute 11 technical papers at the 27th annual SPIE Microlithography conference, to be held March 3 through 8 at the Santa Clara Convention Center and Westin Hotel, in Santa Clara, Calif.

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